Product Demonstration ? CapSpin Photomask Processor
Fully-automated system with cassette-to-cassette handling, configured for the following processes: wet-etching, developing, stripping and spin-drying of photomasks between 3? x 3? and 7? x 7? including a post-etch illumination by an integrated UV-lamp unit.
Main product features are:
ACP is continuing the development and manufacturing of the wet processing equipment product range for the semiconductor industry and related markets with its team of engineers with decades of expertise from contrade and formerly CONVAC GmbH at the existing facility.
The product range includes equipment for photomask processing as mentioned above next to wafer cleaning and processing equipment like lift-off and others.
Furthermore acp is offering solutions for CO2-snow jet cleaning and for measuring particle contaminations on flat surfaces.
Fully-automated system with cassette-to-cassette handling, configured for the following processes: wet-etching, developing, stripping and spin-drying of photomasks between 3? x 3? and 7? x 7? including a post-etch illumination by an integrated UV-lamp unit.
Main product features are:
- Moving masses reduced to best-in-class standard
- Highest reliability of components and lower energy consumption
- All motor components located outside process area which results in highest tool uptime and longer service intervals of these components
- Substrate loading and unloading outside the process chamber
- Self-cleaning function for process chamber for maximized process stability and operator safety
- Modularised machine concept which meets R&D and industry requirements alike
ACP is continuing the development and manufacturing of the wet processing equipment product range for the semiconductor industry and related markets with its team of engineers with decades of expertise from contrade and formerly CONVAC GmbH at the existing facility.
The product range includes equipment for photomask processing as mentioned above next to wafer cleaning and processing equipment like lift-off and others.
Furthermore acp is offering solutions for CO2-snow jet cleaning and for measuring particle contaminations on flat surfaces.
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