MultiCap - Advanced Single Wafer / Metal Lift-off Processor

Advanced Single Wafer Processor

For higher throughput and clustered processing, the MultiCap Single Wafer Wet Processing System is featuring multiple process modules arranged either in horizontal or vertical configuration.

Several process modules for cleaning and processing with aqueous or solvent media can be clustered together in multiple process modules.
  • Open spin process modules
  • Closed spin process modules
  • Single substrate immersion tanks
  • Spin drying modules
  • VUV / Ozone modules
  • Megasonic modules

Advanced Metal Lift-off Processor

For application requiring clean, residue-free and damage-free device structures, features

  • Solvent Immersion Station
  • Solvent Spray Station
  • Rinse / Spin Dry Station
  • Solvent Recirculation Systems

Specifications

Advanced Single Wafer Processor
Clean
Etch
Strip
Advanced Metal Lift-off Processor Lift-off

News

PfeilPRESSBOX

press releaseof acp GmbH

PfeilPaint Expo 2012

We were there

Pfeilfeature in plasticker

Pre-treatment of pastic parts with CO2 snowjet before painting at Volkswagen

PfeilProduct Demonstration

CapSpin Photomask Processor

PfeilSnow for maximum purity

Sensor cleaning with CO2 snow

Contact
acp GmbH
advanced clean production

Tel  +49 - (0)711 68 70 39 - 0
Fax +49 - (0)711 68 70 39 - 10

Business Premises Oelbronn-Duerrn
Tel  +49 - (0)7237 44294 - 160
Fax +49 - (0)7237 44294 - 169

mail@acp-micron.com