The creation of ultraclean surfaces with the patented acp CO2-Snow Cleaning Technology provides a gentle cleaning by different types of interaction with the surface. The acp CO2-Snow Cleaning Technology is characterized by a minimal media consumption and can easily be automated. The patented acp-Jet Nozzlegeometry offers outstanding cleaning performance. >>more

Furthermore we offer the extensive cleaning using Wet-Chemical Processing. In this context we implement all sorts of processes that may include the handling of single substrates such as for example wafers, photo masks and glasses. >>more

With the technology Surface Inspection we offer systems to directly detect particles and film like deposits on technical surfaces. The innovative Inspection solutions provide immediate high resolution Surface Inspection of particles, dust and film like deposits. >>more